Aurelia London Refine & Polish Exfoliation Mask

Aurelia London

Refine & Polish Exfoliation Mask

  • Alcohol FreeYes

  • Silicone FreeYes

  • Sulfate FreeYes

  • Reef SafeYes

  • EU Allergen FreeNo

  • Fragrance FreeNo

  • Oil FreeNo

  • Fungal Acne SafeNo

Key ingredients

  • The formulation includes Vitamin C, Vitamin E, and Alpha Hydroxy Acid (AHA).

Benefits

  • 42% of ingredients may suit dry skin.

  • 33% of ingredients support the skin barrier.

  • 33% of ingredients have antioxidant properties.

  • 30% of ingredients support moisture retention.

  • 24% of ingredients may suit sensitive skin.

  • 21% of ingredients have pore-refining properties.

  • 18% of ingredients have calming properties.

  • 18% of ingredients help improve skin texture.

  • 15% of ingredients support skin hydration.

  • 12% of ingredients support acne control.

  • 9% of ingredients support skin healing.

  • 9% of ingredients support skin radiance.

  • 3% of ingredients may suit oily skin.

  • 3% of ingredients support well aging.

Concerns

  • 24% of ingredients may cause irritation.

  • 21% of ingredients may trigger fungal acne.

  • 18% of ingredients are fragrance ingredients.

  • 12% of ingredients are essential oils.

  • 12% of ingredients are EU-listed allergens.

  • 12% of ingredients may increase sun sensitivity.

  • 3% of ingredients may worsen dry skin.

Frequently asked questions

A quick guide to the formula, based on the product information and ingredient signals available to Skin Pilot.

Full ingredient list

Select an ingredient to explore its catalog signals and related products.

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