PURITO Wonder Releaf Centella Daily Sun Lotion SPF50+ PA++++

PURITO

Wonder Releaf Centella Daily Sun Lotion SPF50+ PA++++

  • EU Allergen FreeYes

  • Sulfate FreeYes

  • Reef SafeYes

  • Fragrance FreeYes

  • Alcohol FreeNo

  • Silicone FreeNo

  • Oil FreeNo

  • Fungal Acne SafeNo

Key ingredients

  • The formulation includes Hyaluronic Acid and Niacinamides.

Benefits

  • 49% of ingredients may suit dry skin.

  • 34% of ingredients support skin hydration.

  • 32% of ingredients may suit sensitive skin.

  • 28% of ingredients support moisture retention.

  • 28% of ingredients support the skin barrier.

  • 23% of ingredients have calming properties.

  • 19% of ingredients support skin healing.

  • 11% of ingredients support well aging.

  • 9% of ingredients have antioxidant properties.

  • 9% of ingredients support acne control.

  • 6% of ingredients may suit oily skin.

  • 4% of ingredients have optical brightening properties.

  • 2% of ingredients support skin radiance.

Concerns

  • 15% of ingredients may cause irritation.

  • 13% of ingredients may trigger fungal acne.

  • 6% of ingredients may worsen dry skin.

  • 2% of ingredients may trigger acne.

  • 2% of ingredients are drying alcohols.

Frequently asked questions

A quick guide to the formula, based on the product information and ingredient signals available to Skin Pilot.

Full ingredient list

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